Researchers develop optimized polysilicon tunneling intermediate recombination layer for high-efficiency perovskite/TOPCon tandem solar cells
Researchers at Chinese Academy of Sciences (CAS) have fabricated an intermediate recombination layer (IRL) featuring a heavily doped boron/phosphorus polysilicon tunneling junction, with tunnel oxide passivated contact (TOPCon) silicon cells serving as the bottom cell for perovskite/TOPCon tandem solar cells (TSCs).
In perovskite/silicon TSCs, the IRL is an important structure electrically connecting the top-side perovskite and bottom-side silicon sub-cells, significantly influencing the overall device performance. The traditional IRL often uses ITO materials to ensure high transmittance and good electrical properties, which, however, usually leads to issues such as sputtering damage and low temperature process limitations.