Researchers develop vapor-deposited high-performance tin perovskite transistors
A research team, led by Professor Yong-Young Noh and Dr. Youjin Reo from the Department of Chemical Engineering at POSTECH (Pohang University of Science and Technology), has developed p-channel Sn2+-halide perovskite TFTs using a thermal evaporation approach with inorganic caesium tin iodide (CsSnI3).
The project was a collaborative effort with Professors Ao Liu and Huihui Zhu from the University of Electronic Science and Technology of China (UESTC) and resulted in the development of high-performance, stable p-channel CsSnI3-based TFTs using a commercially compatible vapor-deposition approach with PbCl2 as an additive. The volatile chloride triggers solid-state reactions and the conversion of as-evaporated precursor compounds. This facilitates the formation of high-quality and uniform perovskite films, and also modulates the high hole density, making them suitable for use as channel layers. The optimized CsSnI3:PbCl2 TFTs delivered average µFE of around 34 cm2 V−1 s−1, on/off ratio of around 108 and storage stability of more than 150 days. The team also demonstrated a large-scale Sn2+-halide perovskite TFT array that overcomes the technical challenges faced in the solution process. The vapor-deposited TFTs could be used in backplanes for organic light-emitting diode displays, or in logic devices and circuits for monolithic three-dimensional integration, where low process temperatures are required.