Stabilizing tin halide perovskites through non‑volatile MACl substitution for high‑performance transistors
Researchers from Hanyang University, Samsung Electronics and Pohang Accelerator Laboratory have reported a breakthrough in the development of thin-film transistors using tin halide perovskites as p-type channel materials. Their work addresses longstanding challenges related to the instability and high defect density of three-dimensional tin halide perovskites, which have until now limited their practical application.
The team focused on formamidinium tin iodide (FASnI₃), a promising candidate for high-performance transistor channels, and introduced a new strategy involving methylammonium chloride (MACl). Unlike its behavior in lead halide perovskites - where MACl acts only as a temporary stabilizer - here, MACl is actually incorporated into the perovskite crystal structure, replacing part of the formamidinium (FA) and iodide (I) content with methylammonium (MA) and chloride (Cl). This compositional adjustment leads to a more stable crystal lattice, resulting in thin films with superior quality, improved crystallinity, and larger grain sizes.