This is a sponsored post by Ergis Group
In 2020, Poland-based Ergis Group launched the noDiffusion film platform, a high-barrier film that offers high level of optical transmittance and low level of light scattering, and the ability to contain transparent conductive electrodes. The new technologies adopted in the production of the barrier films offer a combination of high performance and competitive pricing.
Following years of R&D, Ergis is ready to enter production with its first-gen barrier films, produced using sputtering in a roll-to-roll (R2R) configuration. The company reports performance of around 10-4 wtr performance for its barrier. This is referred to as a "light-barrier" and one that is more than enough for the encapsulation of perovskite materials. The company collaborated with Poland-based Saule Technologies to develop this specific film. Ergis is now shipping barrier film samples to its customers.
Ergis is also working on its 2nd-gen barrier film, which utilizes ALD technology that enables the deposition of high-performance (10-6 wtr) barrier films, suitable for more demanding applications such as OLED displays. The company hopes to achieve samples of ALD barrier films by the first half of 2024.
